Student(s): Michael Nighosian
Project: Novel Precursor Evaluation for Enhanced Blocking in Area Selective Deposition | View Poster (PDF)
Major(s): Materials Science and Engineering (Nanotechnology minor)
Advisor(s): Nicholas Strandwitz
Abstract
To expand the capabilities of computers and components, there is a driving force for increased miniaturization and complexity in microelectronics. A promising approach to smaller features is to incorporate area selective deposition (ASD), a precise process that allows step-by-step conformal film growth on unblocked substrate areas within photolithography steps. As the cost for lithography manufacturing equipment continues to increase, ASD is a cost effective approach that redefines chip manufacturing by utilizing additive bottom up fabrication rather than top down removal of material. However, a current problem with ASD is precursor penetration into blocking monolayers used, which eventually allows for growth and nucleation of thin films. My group hypothesized that larger novel precursor molecules such as tris dimethylamido aluminum (TDMAAl) are less likely to penetrate the blocking layer and allow for selective growth of thicker alumina films, which would improve the viability of ASD. In this study, the growth conditions and behavior of TDMAAl was studied, as well as its blocking compatibility against dodecanethiol (DDT), an organic self assembling monolayer (SAM). I analyzed TDMAAl’s performance against trimethylaluminum (TMA), which is the current standard precursor for growing Al based films. Depositions at temperatures ranging from 100°C to 140°C were executed for various film thicknesses. I observed that TDMAAl was better blocked than TMA at all temperatures, however the best blocking occurred at 140°C. This improved blocking of TDMAAl provides valuable information for compatible precursors and blocking layers for ASD integration into photolithography.
About Michael Nighosian
Michael Nigohosian is an undergraduate senior majoring in Materials Science and Engineering with a Minor in Nanotechnology at Lehigh University. As a Research Assistant for the P.C. Rossin College of Engineering and Applied Science, he has been conducting research under Professor Nicholas Strandwitz on the interfaces of nanomaterials in extreme environments, specifically on using compatible precursors and self assembling monolayers for area selective deposition, for applications in computer logic and memory chip fabrication. Michael’s research interests revolve around nanomaterials, fabrication of NEMs, and materials for energy. Following graduation, he plans to follow these interests by pursuing a PhD in Materials Science and Engineering. Beyond his research, he enjoys outdoor recreation, music, weightlifting, cooking, and traveling.